Spin Cleaning Device Automatic Photoresist Device Model JASC-1200AD
The target work is applicable to a 200mm square substrate or a φ300mm substrate!
The automatic photoresist coating device automatically performs resist spin coating, vacuum baking, alignment, and spray development from cassette to cassette. Of course, you can also select the processes. The loader and unloader can be operated by one operator from the same side. A multi-joint robot is used for transportation between processes. This machine is suitable for 200mm square substrates or φ300mm substrates. For more details, please contact us or refer to the catalog.
- Company：ジャパンクリエイト
- Price：Other
